Used as a precursor in chemical vapor deposition (CVD) processes to deposit copper-containing thin films, particularly in the semiconductor industry for creating conductive layers in electronic devices. It is also employed in the synthesis of advanced materials, such as metal-organic frameworks (MOFs), due to its ability to form stable complexes. Additionally, it serves as a catalyst in organic reactions, including oxidation and polymerization processes. Its hexafluoroacetylacetonate ligand enhances volatility, making it suitable for applications requiring precise control over metal deposition.