Used primarily as a high-performance solvent in advanced electronic manufacturing processes, particularly in photolithography and semiconductor cleaning. Its unique solvating properties enable effective removal of photoresist residues without damaging sensitive microstructures. Also utilized in specialty coatings formulations where low surface tension and high purity are critical. Shows excellent thermal stability and compatibility with a range of polymers, making it suitable for use in precision cleaning applications in aerospace and medical device industries. Its low volatility supports safer handling and reduced environmental impact compared to traditional solvents in closed-loop systems.