Used primarily as a photoacid generator (PAG) in advanced photolithography processes, especially in semiconductor manufacturing. Upon exposure to ultraviolet (UV) or deep UV light, it releases a strong acid that catalyzes chemical transformations in photoresist materials, enabling precise pattern formation on silicon wafers. Its reactivity and efficiency make it suitable for high-resolution imaging in microelectronic device fabrication. Also explored in cationic polymerization reactions where in situ acid generation is required.