Used primarily as a precursor in the synthesis of silicon-based materials, especially in the production of high-purity silicon films via chemical vapor deposition (CVD). Its high silicon content and thermal instability make it suitable for generating reactive silicon species at relatively low temperatures. It is also employed in research settings for the development of novel silane derivatives and organosilicon compounds with potential applications in semiconductors, photovoltaics, and advanced ceramics. Due to its sensitivity to air and moisture, handling requires inert atmosphere conditions, limiting its use to controlled environments.