Used primarily in the semiconductor industry as a precursor for chemical vapor deposition (CVD) processes to deposit silicon nitride and silicon carbide thin films. These films are essential for creating insulating layers and protective coatings in electronic devices. It is also employed in the production of silicones and as a surface modification agent to enhance the properties of materials like glass or metals. Additionally, it serves as a reagent in organic synthesis for introducing silicon-containing functional groups into molecules.