3,3,5-Trimethylcyclohexyl methacrylate

95%,mixture of cis and trans isomers,with 200ppm 4-methoxyphenol

Reagent Code: #238574
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CAS Number 7779-31-9

science Other reagents with same CAS 7779-31-9

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 210.3126 g/mol
Formula C₁₃H₂₂O₂
badge Registry Numbers
MDL Number MFCD00078372
thermostat Physical Properties
Melting Point -15 °C(lit.)
Boiling Point 79 °C at 1 mmHg(lit.)
inventory_2 Storage & Handling
Density 0.93 g/cm3 at 25 °C(lit.)
Storage Room temperature

description Product Description

Used in the synthesis of specialty polymers and resins, particularly in coatings and adhesives requiring enhanced weather resistance and durability. Its bulky cycloaliphatic structure contributes to improved thermal stability and UV resistance in cured films. Commonly employed in radiation-curable systems such as UV-curable inks, coatings, and electronic materials where low volatility and good reactivity are needed. Also utilized to modify polymer glass transition temperature (Tg) and mechanical properties in acrylic copolymers.

shopping_cart Available Sizes & Pricing

Size Availability Unit Price Quantity
inventory 25mg
10-20 days ฿7,200.00
inventory 100mg
10-20 days ฿11,200.00
inventory 250mg
10-20 days ฿20,480.00
inventory 1g
10-20 days ฿47,680.00
3,3,5-Trimethylcyclohexyl methacrylate
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Used in the synthesis of specialty polymers and resins, particularly in coatings and adhesives requiring enhanced weather resistance and durability. Its bulky cycloaliphatic structure contributes to improved thermal stability and UV resistance in cured films. Commonly employed in radiation-curable systems such as UV-curable inks, coatings, and electronic materials where low volatility and good reactivity are needed. Also utilized to modify polymer glass transition temperature (Tg) and mechanical properti

Used in the synthesis of specialty polymers and resins, particularly in coatings and adhesives requiring enhanced weather resistance and durability. Its bulky cycloaliphatic structure contributes to improved thermal stability and UV resistance in cured films. Commonly employed in radiation-curable systems such as UV-curable inks, coatings, and electronic materials where low volatility and good reactivity are needed. Also utilized to modify polymer glass transition temperature (Tg) and mechanical properties in acrylic copolymers.

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