Thin Film Deposition Precursors

Semiconductor Materials

Thin Film Deposition Precursors reagents.

REAGENT

Bis(pentamethylcyclopentadienyl)magnesium, elec. gr.

99.999% metals basis

CAS:74507-64-5

Formula:C₂₀H₃₀Mg

MW:294.77 g/mol

฿25,290.00

View

REAGENT

inS3-54A18

≥98%

CAS:328998-53-4

Formula:C₂₃H₁₆ClNO₂

MW:373.83 g/mol

฿8,190.00

View

REAGENT

(Toluene-3,4-dithiolato)zinc(II)

≥95%

CAS:29726-21-4

Formula:C₇H₆S₂Zn

MW:219.63 g/mol

฿900.00

View

REAGENT

t-Butylimidotris(dimethylamino)tantalum(V)

98%

CAS:69039-11-8

Formula:C₁₀H₂₇N₄Ta

MW:384.30 g/mol

฿6,876.00

View

Cart

No products

Subtotal: 0.00

Total 0.00 THB