Thin Film Deposition Precursors

Thin Film Deposition Precursors reagents.

REAGENT

Bis(pentamethylcyclopentadienyl)magnesium, elec. gr.

99.999% metals basis

CAS:74507-64-5

Formula:C₂₀H₃₀Mg

MW:294.77 g/mol

฿25,290.00

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REAGENT

(Toluene-3,4-dithiolato)zinc(II)

≥95%

CAS:29726-21-4

Formula:C₇H₆S₂Zn

MW:219.63 g/mol

฿900.00

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REAGENT

t-Butylimidotris(dimethylamino)tantalum(V)

98%

CAS:69039-11-8

Formula:C₁₀H₂₇N₄Ta

MW:384.30 g/mol

฿6,876.00

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